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Numerous methods are known to date in the production of graphene. However, most of these methods have limitations that make the resulting graphene materials unsuitable for certain applications. For example, conventional methods for producing graphene from natural graphite or synthetic graphite include removal of the oxide layers using concentrated nitric acid or other acids, and ultrasonication of graphite that has been exfoliated to make individual graphene sheets. However, these types of processes have limitations, such as by-products that make them non-compatible with integration in electronic devices. Furthermore, they are limited by the fact that it is difficult to produce uniform graphene samples and consequently have a broad distribution of grain sizes. Additionally, the methods of production have a low yield of only approximately 20%. The use of chemical gas phase reactions, such as plasma-assisted CVD, has also been attempted. However, these methods have a low yield of approximately 10%.
Novel methods that use water as a reaction medium are believed to be compatible with integration in electronic devices, especially because they result in relatively defect-free graphene. Unfortunately, they are currently very slow and/or time-consuming. In particular, methods including solution-phase exfoliation methods of thermal exfoliation are not commercially viable due to their large reaction times, large amounts of residual hydrochloric acid, and low yields. Furthermore, current exfoliation methods result in high defect-density graphene.
Conventional microwave processing of graphite-based materials can be used to produce nanocarbons, as disclosed in, for example, U.S. Pat. No. 5
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